Overcoming interconnect scaling challenges using novel process and design solutions to improve both high-speed and low-power computing modes

2017 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)(2017)

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摘要
Interconnect scaling in future CMOS technology nodes is projected to cause an unprecedented increase in resistance, making interconnects the key performance limiter instead of transistors. Both high-speed and low-power computing modes based on dynamically changing VDD and frequency will be the most impacted by this trend. To overcome this dilemma we present device-circuit-architecture solutions based on the reconfiguration of i) buffered interconnects and ii) execution architecture. Interconnect is dynamically reconfigured by either CMOS transistors or novel Insulator-Metal-Transition “via” devices. Processor execution resources are dynamically re-provisioned based on operating mode and activity metrics. With projected interconnect resistance, a simulated processor design shows 18% and 15% performance improvement from interconnect and execution architecture reconfiguration, respectively. When combined, these techniques provide 35% performance improvement in high-speed mode and energy efficiency in low-power mode.
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关键词
projected interconnect resistance,high-speed mode,energy efficiency,low-power mode,interconnect scaling challenges,low-power computing modes,future CMOS technology nodes,device-circuit-architecture solutions,CMOS transistors,processor execution resources,insulator-metal-transition via devices
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