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Process Highlights to Enhance Dsa Contact Patterning Performances

A. Gharbi,R. Tiron,M. Argoud,G. Chamiot-Maitral,A. Fouquet,C. Lapeyre,P. Pimenta Barros,A. Sarrazin,I. Servin,F. Delachat,S. Bos,S. Berard-Bergery,J. Hazart,X. Chevalier,C. Nicolet,C. Navarro,I. Cayrefourcq, S. Bouanani,C. Monget

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2016）

Cited 3|Views21
Key words
block copolymer,self-assembly,contact shrink,contact multiplication,planarization
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