Process Highlights To Enhance Dsa Contact Patterning Performances

In this paper, we focus on the directed-self-assembly (DSA) application for contact hole (CH) patterning using polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymers (BCPs). By employing the DSA planarization process, we highlight the DSA advantages for CH shrink, repair and multiplication which are extremely needed to push forward the limits of currently used lithography. Meanwhile, we overcome the issue of pattern density-related-defects that are encountered with the commonly-used graphoepitaxy process flow. Our study also aims to evaluate DSA performances as function of material properties and process conditions by monitoring main key manufacturing process parameters: CD uniformity (CDU), placement error (PE) and defectivity (Hole Open Yield = HOY). Concerning process, it is shown that the control of surface affinity and the optimization of self-assembly annealing conditions enable to significantly enhance CDU and PE. Regarding materials properties, we show that the best BCP composition for CH patterning should be set at 70/30 of PS/PMMA total weight ratio. Moreover, it is found that increasing the PS homopolymer content from 0.2% to 1% has no impact on DSA performances. Using a C35 BCP (cylinder-forming BCP of natural period L-0 = 35nm), high DSA performances are achieved: CDU-3 sigma = 1.2nm, PE-3 sigma = 1.2nm and HOY = 100%. The stability of DSA process is also demonstrated through the process follow-up on both patterned and unpatterned surfaces over several weeks. Finally, simulation results, using a phase field model based on Ohta-Kawasaki energy functional are presented and discussed with regards to experiments.