New Techniques For The Measurement Of X-Ray Beam Or X-Ray Optics Quality

Metrology of XUV beams and more specifically X-ray laser (XRL) beam is of crucial importance for development of applications. We have then developed several new optical systems enabling to measure the x-ray laser optical properties. By use of a Michelson interferometer working as a Fourier-Transform spectrometer, the line shapes of different x-ray lasers have been measured with an unprecedented accuracy (deltalambda/lambdasimilar to10(-6)). Achievement of the first XUV wavefront sensor has enable to measure the beam quality of laser-pumped as well as discharge pumped x-ray lasers. Capillary discharge XRL has demonstrated a very good wavefront allowing to achieve intensity as high 3*10(14) Wcm(-2) by focusing with a f = 5 cm mirror. The measured sensor accuracy is as good as lambda/120 at 13 nm. Commercial developments are under way.