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High-Brightness Sources and Light-Driven Interactions Congress (2024)
Cong Que Dinh,Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka,Soichiro Okada,Shinichiro Kawakami, Arisa Hara,Seiji Fujimoto,Makoto Muramatsu, Reiko Tsuzuki,
Advances in Patterning Materials and Processes XLI (2024)
Optical and EUV Nanolithography XXXVII (2024)
Qi Zhang,Weilun Chao, Warren D. Holcomb,Ryan H. Miyakawa,Dinesh Kumar, Ricardo Ruiz,Andrew R. Neureuther,Patrick P. Naulleau,Cheng Wang
Metrology, Inspection, and Process Control XXXVIII (2024)
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 1 (2024)
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
Cong Que Dinh,Seiji Nagahara, Yuhei Kuwahara,Arnaud Dauendorffer,Soichiro Okada,Seiji Fujimoto,Shinichiro Kawakami,Satoru Shimura,Makoto Muramatsu, Kayoko Cho, Xiang Liu,Kathleen Nafus,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX (2022)
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