In-situ and Non-contact Etch Depth Prediction in Plasma Etching Via Machine Learning (ANN BNN) and Digital Image Colorimetry

Minji Kang, Seongho Kim, Eunseo Go, Donghyeon Paek, Geon Lim,Muyoung Kim, Soyeun Kim,Sung Kyu Jang, Min Sup Choi,Woo Seok Kang, Jaehyun Kim, Jaekwang Kim, Hyeong-U Kim

arxiv（2025）

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