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Cryogenic InP HEMTs with Enhanced Fmax and Reduced On-Resistance Using Double Recess

Yuxuan Chen, Fugui Zhou, Yongheng Gong,Yongbo Su,Wuchang Ding,Jingyuan Shi,Peng Ding,Zhi Jin

IEEE Journal of the Electron Devices Society(2025)

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Key words
cryogenic,InP high-electron-mobility transistor (InP HEMT),double-recess,multilayer cap,on-resistance (RON),maximum oscillation frequency (fmax)
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