Effect of La and Si Additives in Zr-doped HfO2 Capacitors for Pseudo-Linear High-Κ Dielectric Applications.

Minjong Lee,Yong Chan Jung, Jin-Hyun Kim, Dushyant M. Narayan, Sehun Kang, Woo Young Park, Kivin Im,Jiyoung Kim

Nano Convergence（2025）

引用 0|浏览1

关键词

High-κ,Low leakage current,DRAM,BEOL compatibility,Pseudo-linear dielectric,Hf1–xZrxO2,La doping,Si doping,Phase transformation,Anti-ferroelectric

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要