Edge Continual Training and Inference with RRAM-Gain Cell Memory Integrated on Si CMOS
2024 IEEE International Electron Devices Meeting (IEDM)(2024)
关键词
Data Transfer,Indium Tin Oxide,Incremental Learning,Edge Devices,Form Factor,Transfer Rate,Environmental Data,Passivation Layer,High Bandwidth,Optimal Voltage,Area Overhead,Energy Leakage,Memory Technologies,Vertical Connections
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