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Edge Continual Training and Inference with RRAM-Gain Cell Memory Integrated on Si CMOS

2024 IEEE International Electron Devices Meeting (IEDM)(2024)

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Data Transfer,Indium Tin Oxide,Incremental Learning,Edge Devices,Form Factor,Transfer Rate,Environmental Data,Passivation Layer,High Bandwidth,Optimal Voltage,Area Overhead,Energy Leakage,Memory Technologies,Vertical Connections
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