Low-Power CMOS Inverter with Enhancement-Mode Operation and Matched $\mathrm{v}_{\text{th}}$ at $\mathrm{v}_{\text{dd}} =1\ \mathrm{v}$ on Monolayer 2D Material Channel
2024 IEEE International Electron Devices Meeting (IEDM)(2024)
Key words
2D Materials,NOT Gate,Monolayer 2D Materials,Enhancement-mode Operation,Threshold Voltage,Transition Metal Dichalcogenides,Switching Voltage,Channel Material,Static Power Consumption,Atomic Force Microscopy,Power Consumption,Chemical Vapor Deposition,Carrier Mobility,High Gain,Wet Process,Key Metrics,Invertible Operator,Transition Metal Dichalcogenides Materials
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