Impact of Precursor Dosing on the Surface Passivation of AZO/AlO X Stacks Formed Using Atomic Layer Deposition. Yan Wang,Theodore D C Hobson,Jack E N Swallow,Shona McNab, John O'Sullivan,Anastasia H Soeriyadi,Xinya Niu, Rebekah C Fraser, Akash Dasgupta, Soumyajit Maitra,Pietro P Altermatt, Robert S Weatherup,Matthew Wright,Ruy S BonillaEnergy advances（2025）引用 0|浏览4AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
