Cryogenic Cyclical Etching of Si Using CF4 Plasma Passivation Steps: the Role of CF RadicalsJack Nos,Sylvain Iseni,Martin Kogelschatz,Gilles Cunge,Philippe Lefaucheux,Remi Dussart,Thomas Tillocher,Emilie Despiau-PujoAPPLIED PHYSICS LETTERS（2025）引用 0|浏览0AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
