Enhanced Performance and Gate Bias Stress Stability of Atomic-Layer-Deposited Amorphous Zn-Sn-O Thin-Film Transistors with HfO2 and Al-Doped TiO2 Interlayers on SiO2 Gate Oxide

Jinheon Choi, Juneseong Choi, Tae Kyun Kim,Yonghee Lee,Sukin Kang, Sahngik Aaron Mun, Jaewon Ham, Hyungjeung Kim,Cheol Seong Hwang

ACS APPLIED ELECTRONIC MATERIALS（2025）

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amorphous oxide semiconductor,thin-film transistor,Zn-Sn-O,atomic-layer deposition,gate insulator,gate bias stress stability

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