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HgCdTe Surface Passivation with Low-Temperature Plasma-Enhanced Atomic Layer Deposited HfO2

E. R. Zakirov,G. Yu. Sidorov, I. A. Krasnova,V. A. Golyashov, V. I. Vdovin,I. V. Marchishin,O. E. Tereshchenko

APPLIED SURFACE SCIENCE（2025）

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Key words
HgCdTe,Surface passivation,Atomic layer deposition,HfO2,XPS,Metal-insulator-semiconductor
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