Improved Leakage and Fatigue Properties of W/Hf0.5Zr0.5O2/W Capacitor Through the Insertion of Pt Metallic Layer
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING（2025）
关键词
Hf 0.5 Zr 0.5 O 2 thin film,Pt metallic layer,Ferroelectric properties,Leakage current,Dielectric characteristic,Endurance property
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