Ensemble Learning-Fused Solution to the Inverse Problem in Integrated Optical Critical Dimension Metrology
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT(2025)
Key words
Metrology,Nanostructures,Manufacturing,Integrated optics,Optical sensors,Optical scattering,Measurement uncertainty,Azimuth,Weight measurement,Inverse problems,Ensemble learning,integrated metrology,inverse problem solving,measurement precision,Mueller matrix ellipsometry (MME),optical critical dimension (OCD) metrology,optical scatterometry
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