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Sustainable Lithography Paradigm Enabled by Mechanically Peelable Resists

Lei Chen,Huikang Liang,Peng Liu, Cuihong Liu,Bo Feng,Zhiwen Shu,Yiqin Chen,Xiaoqian Dong,Jianfei Xie, Ming Ji,Huigao Duan

Advanced materials (Deerfield Beach, Fla)（2024）

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Key words
chemical-free,conformal manufacturing,mechanically peelable resists,sustainable lithography,transient electronics
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