Interface Sharpness in Stacked Thin Film Structures: a Comparison of Soft X-ray Reflectometry and Transmission Electron Microscopy
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2024）
关键词
EUV reflectometry,scanning transmission electron microscopy and energy dispersive X-ray spectroscopy,SiGe,interface sharpness,layer intermixing
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