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Monitoring the Chemical and Structural Changes During Progressive Aqueous Alteration of Silica Thin Films Deposited by CVD Process : Accurate Thickness Loss Rates Measurements

Farah Inoubli,Babacar Diallo, Konstantina Christina Topka, Raphael Laloo,Emmanuel Veron,Vincent Sarou-Kanian,Brigitte Caussat, Thierry Sauvage,Viviane Turq,Nadia Pellerin

npj Materials Degradation（2025）

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