Ab Initio Device-Driven Screening of Sub-1-nm Thickness Oxide Semiconductors for Future CMOS Technology NodesLinqiang Xu, Yue Hu,Lianqiang Xu,Lin Xu,Qiuhui Li,Aili Wang,Chit Siong Lau,Jing Lu,Yee Sin Angarxiv（2024）引用 0|浏览5AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
