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Experimental and Theoretical Computational Study of Corrosion Inhibitors in the Cobalt Bulk Chemical Mechanical Polishing (CMP) Process

Qinhua Miao,Lei Fan,Fan Zhang, Yaran Lv,Jie Cheng

Journal of Molecular Liquids(2024)

Cited 1|Views3
Key words
Cobalt (Co),Chemical mechanical polishing (CMP),Corrosion inhibitor,TTLYK,Integrated circuit
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