A Strategy to Fabricate Nanostructures with Sub-Nanometer Line Edge Roughness
Nanotechnology（2024）
关键词
scanning helium ion beam lithography,line edge roughness,suspended SiNx membrane,hydrogen silsesquioxane resist,designed exposure linewidth
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要