Fabrication of Hybrid Fin/Planar LDMOS with Modulation Gate
Device Research Conference（2024）
Key words
Hybrid Fabrication,Modulation Gate,Types Of Pain,Photoresist,Parallel Layers,Technology Node,Gate Oxide,Increased Contact Area,Gate Length,Gate Capacitance,Gate Leakage,Subthreshold Slope,Flexible Tuning,Drift Region,Dry Etching Process
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