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Full Mission Evaluation of EnMAP Water Leaving Reflectance Products Using Three Atmospheric Correction Processors

Mariana A. Soppa,Maximilian Brell,Sabine Chabrillat,Leonardo M. A. Alvarado,Peter Gege,Stefan Plattner, Ian Somlai-Schweiger,Thomas Schroeder,Francois Steinmetz,Daniel Scheffler,Vittorio E. Brando,Mariano Bresciani,Claudia Giardino,Simone Colella,Dieter Vansteenwegen,Maximilian Langheinrich,Emiliano Carmona,Martin Bachmann,Miguel Pato,Sebastian Fischer,Astrid Bracher

OPTICS EXPRESS（2024）

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