Simulation and Metrological Applications for RDL Patterning Development of Glass Substrate

Chang-Chun Lee,Jui-Chang Chuang,Chen-Tsai Yang, Chung-I-I Li, Shih-Hsien Lee, Shih-Hao Kuo

PROCEEDINGS OF THE IEEE 74TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, ECTC 2024（2024）

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Key words

Glass Substrate,Finite Element Analysis (FEA),Digital Optical Method,Mask-less Digital Lithography

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