Future of Plasma Etching for Microelectronics: Challenges and Opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter,Robert L. Bruce,Jane P. Chang, Jessica C. Demott,Vincent M. Donnelly,Remi Dussart,Andreas Fischer,Richard A. Gottscho,Satoshi Hamaguchi,Masanobu Honda,Masaru Hori,Kenji Ishikawa, Steven G. Jaloviar,Keren J. Kanarik,Kazuhiro Karahashi,Akiteru Ko, Hiten Kothari,Nobuyuki Kuboi,Mark J. Kushner,Thorsten Lill,Pingshan Luan,Ali Mesbah,Eric Miller, Shoubhanik Nath,Yoshinobu Ohya,Mitsuhiro Omura,Chanhoon Park, John Poulose,Shahid Rauf,Makoto Sekine, Taylor G. Smith,Nathan Stafford, Theo Standaert,Peter L. G. Ventzek JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B（2024）
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