Atomic Layer Deposited Alx Niy O as Hole Selective Contact for Silicon Solar Cells
2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)(2019)
摘要
Atomic layer deposited Al
x
Ni
y
O with different concentrations of Al are investigated as hole selective contact for crystalline silicon solar cells. Spectroscopic ellipsometry reveals that these Al
x
Ni
y
O films have a bandgap of 2.8-3.3 eV. This incorporation of Al increases the hole selectivity of the NiO film in a way that the contact resistivity of the Al
x
Ni
y
O films with Si is significantly lower. These results are consistent with density functional theory calculations indicating the presence of shallow defects in the bandgap of Al
x
Ni
y
O which contribute to the improved hole selectivity. This work demonstrates the potential of Al
x
Ni
y
O as a hole-selective contact for crystalline solar cells.
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关键词
atomic layer deposition,hole selective contact,photovoltaic cells,silicon.
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