LSPR anisotropy minimization by sequential growth of Ag nanoparticles on nanoripple patterned Si surface for SERS Application

The present work describes the formation of low-aspect-ratio Ag nanoparticles (NPs) arrays by sequential deposition of Ag from different growth directions on a nanoripple-patterned Si substrate, produced by low-energy ion beam irradiation. It is observed that the growth of Ag-NPs on ripple surfaces is direction-dependent due to the asymmetric ridge of the ripple pattern. This asymmetric ridge can be utilized to tune the shape of NP from elongated to spherical and in turn, assists in minimizing the LSPR anisotropy. The Finite-Difference-Time-Domain (FDTD) simulations demonstrate that the interparticle gap, major, and minor axis combinations of a NP are crucial in minimizing anisotropic near-field interaction. NPs grown perpendicular to the ripple from either direction lead to an elongated chain of nanoparticles; however, if a proper combination of sequential growth times is chosen then the aspect ratio of NPs can be tuned from elongation to spherical ones. Interestingly, a LSPR shift of 209 nm was observed when NPs are grown for 60 min on ripple patterns from one direction only. On the other hand, it reduces to 54 nm when NPs are sequentially grown for 30 min from each of directions, perpendicular to the ripples. SERS measurements also evidence a minimized anisotropic nature in sequentially grown NP arrays; hence, the growth direction as well as optimized growth times together can be used to control the LSPR anisotropy of NP arrays which can be used to fabricate such isotropic SERS substrates.