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Gate Trench Dry Etching Technology with Damage Blocking Layer for GaN HEMT Devices

Jiaqi Guo,Ke Wei,Sheng Zhang, Xiaoqiang He,Yichuan Zhang, Ruizhe Zhang, Kaiyu Wang, Jianchao Wang, Ailing Zhou,Sen Huang,Yingkui Zheng,Xiaojuan Chen,Xinhua Wang,Xinyu Liu

VACUUM(2024)

引用 2|浏览22
关键词
Dynamic protective layer,Electron mobility,Surface roughness,Etching products,X-ray photoelectron spectroscopy (XPS)
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