High quality PVD-MoS₂ film on plasma-ALD-SiO₂ underlaying material for CFET integration

Naoki Matsunaga, Shinya Imai,Takanori Shirokura,Kazuo Tsutsui, Kuniyuki Kakushima,Hitoshi Wakabayashi

2024 8th IEEE Electron Devices Technology &amp; Manufacturing Conference (EDTM)（2024）

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High quality PVD-MoS2 film on plasma-ALD-SiO2 underlaying material for CFET integration