Effect of CH4 concentration on the early growth stage of patterned diamond using high seeding density and hot filament chemical vapor deposition

A bottom-up method is described to grow patterned polycrystalline diamond on silicon substrates using polymer assisted seeding and photolithography. Diamond seeding densities were > 1011 cm−2. The pattern consists of well-defined features ranging from microns to millimeters in size. A systematic study was carried out to investigate the effects of CH4 concentration (1.5, 2.0, 2.5, and 3.0