Effect of Surface Roughness of Ceramic Substrate on Microstructure and Electric Detonation Performance

In order to study the effect of the surface roughness of the ceramic substrate on the microstructure and electric explosion performance of the explosive foil, copper films were prepared by magnetron sputtering on three kinds of alumina ceramic substrates with different surface roughness (surface roughness is 0.01um, 0.12um, 0.25um, respectively), and the corresponding copper explosive foils were successfully obtained by lithography technology. The structure and morphology of the three samples were characterized by scanning electron microscope, confocal microscope, white light interferometer, atomic force microscope and four-probe resistivity tester. The results of the electrical explosion performance test of the three samples showed that when the charging voltage was low, the discharge capacity of the high surface roughness was significantly lower than that of the peak current and burst current of the low surface roughness. Moreover, the explosion time is significantly advanced, and the greater the surface roughness, the more defects of the energy exchange element, which will cause the advance of the electric explosion time, when the charging voltage is larger, the impact caused by the surface roughness will be significantly smaller.