Growth of two-inch free-standing heteroepitaxial diamond on Ir/YSZ/Si (001) substrates via laser-patterned templates
arxiv(2024)
摘要
In this paper, 2-inch free-standing diamonds were prepared by using
heteroepitaxy on composite Ir/YSZ/Si (001) substrates. To release stress,
patterned templates were fabricated using laser etching after the initial
growth of 50-nm-diamond. Then, the subsequent growth was completed on a
patterned template. The full width at half maximum of the diamond (400) and
(311) X-ray rocking curves were 313.5 and 359.3 arcsecs, respectively. Strong
band-edge emission in the cathodoluminescence spectrum of the resulting diamond
revealed excellent crystalline quality. Furthermore, the 2D mapping of Raman
spectra was conducted on a 2 mm × 2 mm area located at the center of the
2-inch sample with a thickness of 400 μm. The result showed an average
peak width of 2.85 ± 0.36 cm^-1 and residual stress of -0.03 ± 0.37
GPa. The dislocation density, determined by counting etching pits generated
from H_2/O_2 plasma etching, was estimated to be around 2.2 × 10^7
cm^-2. These results evidence that the laser-patterned method can
effectively release stress during the growth of large-size diamonds, offering a
simpler and more cost-effective alternative to the traditional
photolithography-patterned scheme.
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