Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas Juliano Borges,Hongwen Yan, Devi Koty, Sophia Rogalskyj, Lynne Gignac, Leonidas Ocola,Marinus Hopstaken, Steven Molis, Andrew Simon,John Arnold, Jeffrey Shearer,Robert L. BruceAdvanced Etch Technology and Process Integration for Nanopatterning XIII（2024）引用 0|浏览2暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
