Kinetic simulations of low temperature plasmas used for plasma processing Thomas G. Jenkins, Daniel Main, Eve Lanham,Scott E. Kruger,John R. CaryAdvanced Etch Technology and Process Integration for Nanopatterning XIII（2024）引用 0|浏览1暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
