Identifying trends in photoresist polymer properties to improve line and space defects

Benjamin D. Rafael-Naab,Jong Keun Park,Emad Aqad,Yinjie Cen,Suzanne M. Coley, Li Cui, Conner Hoelzel,Choong Bong Lee,Jason Behnke,Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, Niradha Sachinthani, Michael Finch,Karen E. Petrillo,Li Cheng

Advances in Patterning Materials and Processes XLI（2024）

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