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Pushing the Boundaries of Random Logic Metal Patterning with Low-N EUV Single Exposure

Syamashree Roy,Arame Thiam,Kaushik Sah,Yannick Feurprier, Nobuyuki Fukui,Kathleen Nafus,Kenichi Miyaguchi,Dieter Van Den Heuvel,Balakumar Baskaran,Joost Bekaert,Andrew Cross,Mircea Dusa,Victor M. Blanco Carballo

OPTICAL AND EUV NANOLITHOGRAPHY XXXVII（2024）

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Key words
Bright-Field,Low-n,Real Logic design,PnR,SRAM,LCDU,GCDU
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