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Computational lithography and patterning evaluation to support EUV high-NA stitching

Cyrus E. Tabery, Jiuning Hu,Rongkuo Zhao,Christoph Hennerkes,Stephen Hsu, Yunbo Liu,Natalia Davydova, Victor M. Blanco,Vincent J. Wiaux

Optical and EUV Nanolithography XXXVII（2024）

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