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Advanced EUV Patterning of 2D TMDs for CMOS Integration

Vina Faramarzi,Etienne de Poortere, Syam Parayil Venugopalan,Pieter Woltgens,Youngtag Woo,Mark van de Kerkhof, Pawan Kumar,Henry Medina Silva,Pierre Morin,Inge Asselberghs,Chelsey Dorow, Kevin O'Brien,Kirby Maxey,Uygar Avci

NOVEL PATTERNING TECHNOLOGIES 2024（2024）

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Key words
2D materials,defect characterization,transition metal dichalcogenides,area-selective,EUV
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