Effect of magnetron sputtering C-doped CrN film on the conductivity and corrosion resistance of 304 stainless steel bipolar plates

Using a high-power impulse and direct current (DC) magnetron sputtering approach, C-doped CrN films with various C-target pulse frequencies are created on the surface of SS 304. The microstructure, corrosion resistance and conductivity of the films are examined. With the decreases of C-target pulse frequency, the roughness of the CrCN films decreases and the density increases. The results of XPS and TEM analyses demonstrate that C atoms are either present in CrN lattice as interstitial atoms or precipitate at grain boundaries to form amorphous carbon, which facilitates the increase of film density and conductivity. In the potentiodynamic tests, the CrCN-1000 Hz film exhibits the lowest corrosion current density 0.54 μA/cm2 at 0.6 V vs. Ag/AgCl potential. The values of icorr and Ecorr are 0.11 μA/cm2 and 0.427 V, respectively. Furthermore, the CrCN-1000 Hz film has the lowest interface contact resistance (ICR) under a compaction force of 140 N/cm2 after potentiostatic polarization test, indicating that C doping is beneficial to improve the corrosion resistance and conductivity of CrN film.