Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry
arxiv(2024)
摘要
Next-generation nano and quantum devices have increasingly complex 3D
structure. As the dimensions of these devices shrink to the nanoscale, their
performance is often governed by interface quality or precise chemical or
dopant composition. Here we present the first phase-sensitive extreme
ultraviolet imaging reflectometer. It combines the excellent phase stability of
coherent high-harmonic sources, the unique chemical- and phase-sensitivity of
extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging
algorithms. This tabletop microscope can non-destructively probe surface
topography, layer thicknesses, and interface quality, as well as dopant
concentrations and profiles. High-fidelity imaging was achieved by implementing
variable-angle ptychographic imaging, by using total variation regularization
to mitigate noise and artifacts in the reconstructed image, and by using a
high-brightness, high-harmonic source with excellent intensity and wavefront
stability. We validate our measurements through multiscale, multimodal imaging
to show that this technique has unique advantages compared with other
techniques based on electron and scanning-probe microscopies.
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