Novel methods for synthesizing high-quality thin films through short and ultrashort high-power pulsed magnetron sputtering
ST PETERSBURG POLYTECHNIC UNIVERSITY JOURNAL-PHYSICS AND MATHEMATICS(2023)
摘要
The present study focuses on investigating the increase in average ion current density to the substrate in short and ultra-short high- power impulse magnetron sputtering (HiPIMS). Theoretical and experimental evidence demonstrates that, while maintaining the average power level of HiPIMS, the ultra-short mode enables a more than threefold increase in the ion current density of the target material onto the substrate. These findings hold promise for enhancing the quality of HiPIMS ion-plasma vapor deposition (IPVD) coatings.
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关键词
high-power impulse magnetron sputtering,plasma vapor deposition,thin films
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