Microstructural Characterization and Inductively Coupled Plasma-Reactive Ion Etching Resistance of Y 2 O 3 –Y 4 Al 2 O 9 Composite under CF 4 /ar/o 2 Mixed Gas Conditions
Scientific Reports（2024）
Key words
Plasma etching,Y2O3-YAM composite,Microstructure,Etching resistance,Semiconductor manufacturing
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