Ultrafast Non-volatile Floating-gate Memory Based on All-two-Dimensional Materials.

Advanced materials (Deerfield Beach, Fla.)(2024)

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Abstract
The explosive growth of massive-data storage and the demand for ultrafast data processing require innovative memory devices with exceptional performance. Two-dimensional (2D) materials and their van der Waal heterostructures with atomically sharp interfaces hold great promise for innovations in memory devices. Here, we present non-volatile, floating-gate memory devices with all functional layers made of 2D materials, achieving ultrafast programming/erasing speeds (20 ns), high extinction ratios (up to 108 ), and multi-bit storage capability. These devices also exhibit long-term data retention exceeding 10 years, facilitated by a high gate-coupling ratio (GCR) and atomically sharp interfaces between functional layers. Additionally, we demonstrate the realization of an "OR" logic gate on a single-device unit by synergistic electrical and optical operations. The present results provide a solid foundation for next-generation ultrahigh-speed, ultralong lifespan, non-volatile memory devices, with a potential for scale-up manufacturing and flexible electronics applications. This article is protected by copyright. All rights reserved.
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