Nanometrology based control: taming radical grafting reactions with attoliter precision

Precisely controlled micropatterning with organic moieties is a promising route for designing smart surfaces, enabling the development of microsensors and actuators with optimal usage of reactants. Such applications require fine control over the surface modification process, which in turn demands detailed knowledge about the surface modification process. As complex surface kinetics often emerge as a result of even slight modifications of the grafting entity, non-invasive, sensitive and precise closed loop control strategies are highly desirable. In this paper we demonstrate that a nanometrology approach based on quantitative phase imaging (QPI) fulfill all these requirements. We first use the technique to monitor surface photografting kinetics of aryl radicals, comprehensively analyzing the effect of substituents on surface addition reactions. We demonstrate that several aspects of the grafting process are affected in complex ways, rendering open-loop strategies impossible to implement precisely. Then, we show that the operando optical phase signal can be used as a direct feedback, guiding the grafting reaction process. Using relatively simple instrumentation, we demonstrate that general and precise control strategies can be designed and used to control the volume of the grafting material with attoliter precision, in spite of radically different surface modification kinetics spanning several orders of magnitude. A nanometrology approach is used to quantify and control the photografting of different aryl radicals. In spite of grafting kinetics spanning several orders of magnitude, the volume of the grafted patterns can be controlled with attoliter precision.