1.43 kV GaN-based MIS Schottky barrier diodes

JOURNAL OF PHYSICS D-APPLIED PHYSICS(2024)

引用 0|浏览4
暂无评分
摘要
In this letter, we report on a quasi-vertical GaN-based metal-insulator-semiconductor (MIS) Schottky barrier diode (SBD) with an insertion of 2 nm thick Al2O3 dielectric layer. It shows a turn-on voltage of 0.7 V, a specific on-resistance of 3.5 m omega center dot cm2, and a high on/off current ratio of 1011. The proposed structure enables a breakdown voltage of 1430 V, rendering a Baliga's power figure-of-merit of 0.58 GW cm-2. The enhanced performance is attributed to defect-related leakage can be suppressed and the direct tunneling process dominates at the MIS-based Schottky contact interface.
更多
查看译文
关键词
gallium nitride,metal-insulator-semiconductor (MIS),quasi-vertical Schottky barrier diodes
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要