Designing a Universal Undulator Beamline for Materials Science: A Conceptual Approach

I. P. Dolbnya,I. A. Bataev,Ya. V. Rakshun,V. A. Chernov, Yu. V. Khomyakov, M. V. Gorbachev, N. I. Chkhalo, D. A. Krasnorutsky,V. S. Naumkin, A. N. Sklyarov,N. A. Mezentsev, A. M. Korsunsky

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques(2023)

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摘要
We present the conceptual design of a universal materials-research beamline based on the undulator of a fourth-generation synchrotron-radiation source. The distinctive feature of the beamline is its capability to work with both spectrally narrow (Δ E / E ~ 10 –4 ) and relatively broad, high-intensity radiation beams (5 × 10 –2 ). The optical scheme enables rapid switching between diffraction, radiographic, and spectroscopic experimental methods while keeping the beam’s position fixed on the test sample and varying the spot size of the radiation from 100 nm to 1 mm.
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关键词
synchrotron radiation,materials science,in situ,X-ray diffraction,Laue diffraction,X-ray imaging,XAFS,extended undulator harmonics,submicrometer focusing,double-mirror multilayer monochromator,quadruple-crystal monochromator,Kirkpatrick–Baez mirrors
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