Comparator with Non-Uniform Parameter Compensation using Dual-Gate Thin-Film Transistors

IEEE Electron Device Letters(2024)

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摘要
Benefitting from the availability of a top gate serving as an “auxiliary” input terminal, a dual-gate (DG) thin-film transistor (TFT) can be incorporated in a circuit and used to mitigate potential performance degradation induced by the inevitable variation in TFT parameters. The utility of this scheme is demonstrated with the design, fabrication and characterization of a comparator. Compared to the traditional output storage compensation scheme deployed in state-of-the-art comparators based on conventional single-gate TFTs, the present scheme based on DG TFTs offers a reduction in amplifier stage count to 2 from 4 or 5, a reduced TFT count of 9, and a reduction in offset error from ~0.4 V to 14 mV for comparators with D flip-flop while operating at a sampling rate of 2000 samples/s. The TFTs are fabricated using a 300-°C metal-oxide TFT technology, potentially enabling their monolithic integration with bio-potential sensing circuits on a flexible substrate.
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关键词
metal-oxide,thin-film transistor,comparator,compensation,non-uniformity
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