Experimental and Theoretical Studies on Ag Nanoparticles with Enhanced Plasmonic Response, Formed Within Al2O3 Thin Films Deposited by Magnetron Sputtering

Reactive magnetron sputtering was employed to prepare nanocomposite thin films of Ag/Al2O3, on a glass substrate. The films are characterized by the formation of Ag nanoparticles embedded in the Al2O3 matrix, after thermal treatment at 600 °C, which are responsible for the appearance of an outstanding pronounced and narrow localized surface plasmon resonance (LSPR) band. Electron microscopy analysis also revealed the presence of larger Ag fractal aggregates at the film’s surface, responsible for a broad band absorption. Noteworthily, the LSPR band maximum remains at the same position (about 412 nm) for Ag concentrations ranging from 23 to 34 at.