X-ray multibeam ptychography at up to 20 keV: nano-lithography enhances X-ray nano-imaging
arxiv(2024)
摘要
Non-destructive nano-imaging of the internal structure of solid matter is
only feasible using hard X-rays due to their high penetration. The highest
resolution images are achieved at synchrotron radiation sources (SRF), offering
superior spectral brightness and enabling methods such as X-ray ptychography
delivering single-digit nm resolution. However the resolution or field of view
is ultimately constrained by the available coherent flux. To address this, the
beam's incoherent fraction can be exploited using multiple parallel beams in an
approach known as X-ray multibeam ptychography (MBP). This expands the domain
of X-ray ptychography to larger samples or more rapid measurements. Both
qualities favor the study of complex composite or functional samples, such as
catalysts, energy materials, or electronic devices. The challenges of
performing ptychography at high energy and with many parallel beams must be
overcome to extract the full advantages for extended samples while minimizing
beam attenuation. Here, we report the application of MBP with up to 12 beams
and at photon energies of 13 and 20 keV. We demonstrate performance for various
samples: a Siemens star test pattern, a porous Ni/Al2O3 catalyst, a
microchip, and gold nano-crystal clusters, exceeding the measurement limits of
conventional hard X-ray ptychography without compromising image quality.
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