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Challenges in Scaling of IPVD Deposited Ta Barriers on OSG Low‐k Films: Carbonization of Ta by CHx Radicals Generated Through VUV‐induced Decomposition of Carbon‐containing Groups

Alexey N. Ryabinkin,Alexey S. Vishnevskiy,Sergej Naumov,Alexander O. Serov,Konstantin I. Maslakov,Dmitry S. Seregin,Dmitry A. Vorotyntsev,Alexander F. Pal,Tatyana V. Rakhimova,Konstantin A. Vorotilov,Mikhail R. Baklanov

PLASMA PROCESSES AND POLYMERS（2024）

引用 0|浏览18
关键词
absorption,degradation,IPVD,low-k dielectrics,VUV
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